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Cost-effective and large area lithography system based on electric-arc for micro/nanostructuring of Graphene and thin film conductors: development and phenomenology

dc.contributor.authorGarcía Vélez, Miguel
dc.date.accessioned2015-10-15T10:19:27Z
dc.date.available2015-10-15T10:19:27Z
dc.date.issued2015
dc.identifier.urihttp://hdl.handle.net/10115/13321
dc.descriptionTesis Doctoral leída en la Universidad Rey Juan Carlos de Madrid en 2015. Directores de la Tesis: Ángel Luis Álvarez Castillo y María del Carmen Coya Párragaes
dc.language.isoenges
dc.publisherUniversidad Rey Juan Carloses
dc.rightsAtribución-NoComercial-SinDerivadas 3.0 España
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es/
dc.subjectTelecomunicacioneses
dc.titleCost-effective and large area lithography system based on electric-arc for micro/nanostructuring of Graphene and thin film conductors: development and phenomenologyes
dc.typeinfo:eu-repo/semantics/doctoralThesises
dc.rights.accessRightsinfo:eu-repo/semantics/openAccesses
dc.subject.unesco3306.02 Aplicaciones Eléctricases
dc.subject.unesco3325 Tecnología de las Telecomunicacioneses


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Atribución-NoComercial-SinDerivadas 3.0 EspañaExcept where otherwise noted, this item's license is described as Atribución-NoComercial-SinDerivadas 3.0 España